CLASS TITLE:

Simulation of Micro and Nano-Patterning using plasma processes

 

 

Graduate Programme of mathematical Simulation in the School of Applied Mathematics and Physics of the National Technical University

Class title:

Simulation of Micro and Nano-Patterning using plasma processes

Semester-Direction:

Spring Semester

Technology

Instructors:

 

Εvangelos Gogolides, George Kokkoris, Vasilios Constantoudis, Angeliki Tserepi

 

Class Description

Α) Instructor Dr Evangelos Gogolides

Introduction to micro and nano technology and to patterning processes. Introduction to lithography and plasma etching.

Charged particle motion in electric and magnetic fields. Atomic and molecular collisions with electrons in the gas phase.

Basic Plasma equations. Maxwell equations, Boltzmann equation, electron energy distribution.

Mass, momentum, and energy balances as moments of the Boltzmann equation.

Chemical kinetics in the plasma phase.

Chemical kinetics on the surfaces.

Solution of mass, momentum and energy balances in capacitively coupled discharges.

Solution of mass, momentum and energy balances in inductively coupled discharges.

B) Instructor Dr Vasilios Constantoudis

Analysis of surfaces and devices formed with micro and nano patterning.

Surface and Line Edge Roughness and the technological importance of its control.

AFM and SEM surfaces

Self affine and fractal surfaces

Analysis of AFM and SEM surfaces using fractal and scaling theory.

Feedback of scaling analysis of surfaces to plasma process understanding.

C) Instructor Dr. George Kokkoris

Simulation of micro and nano structure fabrication

Front evolution and process evolution using level set methods

           Front evolution methods

           The level set method

           Applications of the level set method

           Applications of the level set method in plasma etching for micro and nano fabrication

D) Instructor Dr Angeliki Tserepi

From theory to experiment

Plasma reactors in the Institute of Microelectronics

Plasma diagnostic methods.

Demonstration of micropatterning process with plasma etching.

Demonstration of plasma diagnostics.

 

Recommended Textbook

  1. F. F. Chen and J.P. Chang, Lecture Notes on Principles of Plasma Processing, Kluwer Academic/Plenum Publishers 2003
  2. M.A. Lieberman, A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, John Wiley & Sons 1994
  3. Numerical Recipes, the art of Scientific Computing, W.H. Press, S. A. Teukolsky, W. T. Vetterling, B.P. Flannery, Cambridge University Press

 

Prerequisite Knowledge

Undergraduate Physics, Chemistry, Calculus, and computer programming

(e.g. C language, or Matlab).

 

Exams, homework

Homework, take home exercises, simulation projects