New electron beam lithography tool for IMEL !

For the nanopatterning needs of the Institute, we have placed an order for a dedicated electron beam lithography tool from Vistec Lithography Group. The EBPG5000plusES system is a high-performance lithography tool with an electron-optical column operating at 100 keV that provides a spot size down to <2.2nm, which allows the routinely generation of features below 8nm. This system is the first of its kind in Greece and it will play a significant role in the expansion of IMEL’s activities.

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