Objectives

Project I.4: Thin films by chemical vapor deposition (CVD)

Objectives

The objectives of this group include research and development in the following:


Home About IMEL Organisation Location Contact	Research Micro and Nanofabrication i. Lithographic Polymers and Processes ii. Plasma Processing and Simulation for Micro and Nano Patterning iii. Front-end processes for Micro and Nanodevices iv. Thin films by chemical vapor deposition (CVD) Nanostructures and Nanoelectronic Devices i. Nanostructures for nanoelectronics and photonics ii. Materials and devices for memory applications iii. Molecular materials as components of electronic devices Sensors and MEMs i. Porous silicon technology and applications ii. Mechanical and chemical sensors iii. Energy Harvesting Materials and Devices iv. Bio-microsystems v. Thin films devices for large area electronics vi. Circuits and devices for optoelectronic interconnections R&D Projects EU Projects National Projects	Publications Journal Papers Conference Papers Annual Reports Patents PhD & Master Theses	People Researchers	Facilities & Services Minasys - Center of Excellence Nanotechnology and MEMS laboratory Lab 1 Lab 2 Lab 3 Lab 4 Software	Education PhD Master Courses Training How to apply	News & Events Research highlights Awards & Distinctions Events Conferences & Workshops Lectures Schools & Seminars Past Events Job opening