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The Vistec EBPG5000plusES is a high-performance lithography tool based on reliable and well-proven system architecture. Due to its electron-optical column the system can expose various substrate types. The system provides a spot size down to <2.2nm, which allows the routinely generation of nano-dimensional features below 8nm. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse ?multi user environments." Professor Dimitris Tsoukalas, Director of IMEL, explains: "Due to the different fields of research carried out at the IMEL we had very special demands for the new patterning system. It not only had to be capable of a multi user environment but also had to provide high class and efficient nano-lithography in all areas of our activities spanning from nanoelectronic devices to sensors and MEMS/NEMS. The EBPG5000plusES is the perfect match to these requirements and it will allow IMEL to further improve its position at the nanotechnology forefront." Due to its expertise and infrastructure IMEL is the key institution for top-down nano-research in Greece. Rainer Schmid, General Manager at Vistec Lithography comments the order: "We are honoured to have received an order from an institute with such a reputation. The EBPG5000plusES will be the first 100kV system in Greece. That will not only enable the institute to maintain its leading role in national nano-research but also to participate in European research projects, networks of excellence, and technology platforms at the highest level." Related links:
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High-performance lithography tool at IMEL
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