Patents

• Method for the fabrication of high surface area ratio and high aspect ratio surfaces on substrates
  Tserepi Angeliki, Gogolidis Evangelos, Misiakos Konstantinos, Vlachopoulou Maria-Elena, Vourdas Nicolaos
  This invention provides a method for the fabrication of surfaces of high surface area ratio on polymeric/plastic materials, and their application in the control of the wetting properties of surfaces, of the transport of liquids on such fabricated...
  Greek patent Application number: 20050100473
  PCT Application number: PCT/GR2006/000011
  Patent record available from the World Intellectual Property Organization (WIPO)
  Publication number: WO2007031799, Publication date: 2007-03-22,
  Application number: WO2006GR00011 20060308
  
  
• Molecular resists based on functionalized polycarbocycles
  Argitis Panagiotis, Gogolides Evangelos, Couladouros Elias, Niakoula Dimitra, Vidali Veroniki, Gautam Daman R.
  The present invention refers to new organic molecules, derived from the class of polycarbocycle derivatives, and their application as components of photoresists, and in particular as components of photoresist compositions where no polymer is comprised as...
  Greek patent Application number: 20050100472
  PCT Application number: PCT/GR06/000050
  Patent record available from the World Intellectual Property Organization (WIPO)
  Publication number: WO2007031803, Publication date: 2007-03-22,
  Application number: WO2006GR00050 20060918
  
  
• Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes
  Gogolides Evangelos, Argitis Panagiotis, Bellas Vasilios, Tegou Evangelia, Inst. Microelectronics-NCSR
  Materials are described suitable for optical lithography in the ultraviolet region (including 157 nm and extreme ultraviolet region), and for electron beam lithography. These materials are based on new homopolymers and copolymers, they are characterized...
  Greek patent Application number: 20020100253
  PCT Application number: PCT/GR03/00018
  Patent record available from the World Intellectual Property Organization (WIPO)
  Publication number: WO03102695, Publication date: 2003-12-11,
  Application number: WO2003GR00018 20030530
  Patent record available from the European Patent Office
  Publication number: EP1552346, Publication date: 2005-07-13,
  Application number: EP20030725462 20030530
  
  
• Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties
  Gogolides Evangelos, Argitis Panagiotis, Couladouros Elias, Vidali Veroniki, Vasilopoulou Maria, Cordoyiannis George
  This invention relates to mixed carbocycle derivatives containing at least two carbocycles per molecule from the group of anthracenes, adamantanes and steroids with functionalized carbon chains, to their preparation and to their use as modifiers of resist properties.
  Greek patent Application number: 20010100506
  PCT Application number: PCT/EP02/12284
  Patent record available from the European Patent Office
  Publication number: EP1444550, Publication date: 2004-08-11,
  Application number: EP20020790329 20021031
  Patent record available from the US Patent Office
  Publication date: 2005-02-03 Application number: 20050026068
  
  
• Method for the fabrication of suspended porous silicon microstructures and application in gas sensors
  Tsamis Christos, Tserepi Angeliki, Nassiopoulou Androula, NCSR "Demokritos"
  This invention provides a front-side silicon micromachining process for the fabrication of suspended Porous Silicon membranes in the form of bridges or cantilevers and of thermal sensor devices employing these membranes. The fabrication of the suspended...
  Greek patent Application number: 20010100378
  PCT Application number: PCT/GR02/00008
  Patent record available from the World Intellectual Property Organization (WIPO)
  Publication number: WO03011747, Publication date: 2003-02-13,
  Application number: WO2002GR00008 20020218
  Patent record available from the European Patent Office
  Publication number: EP1417151, Publication date: 2004-05-12
  Application number: EP20020712117 20020218
  Patent record available from the US Patent Office
  Publication date: 2004-10-04
  Application number: 20040195096
  
  
• Method for masking silicon during anisotropic wet etching
  Normand Pascal, Beltsios Konstantinos, Tserepi Angeliki, Aidinis Konstantinos, Tsoukalas Dimitrios
  A method for masking mono-crystalline or poly-crystalline silicon surfaces against a wide variety of anisotropic wet etchants for the purpose of forming silicon micromachined structures is disclosed. The method consists of exposing one or more silicon...
  Patent record available from the European Patent Office
  Publication number: EP1241703, Publication date: 2002-09-18
  Application number: EP20010600006 20010313
  
  
• Silylation of epoxy-containing photoresist films
  Gogolides Evangelos, Tegou Evangelia, Argitis Panagiotis, Hatzakis Michael
  A high resolution pattern transfer processes is described, whereby epoxy containing photoresist films are imagewise exposed to radiation, baked to crosslink the exposed areas, and treated with a silylating medium, which reacts with the epoxy ring thereby...
  Patent record available from the US Patent Office
  US patent number: 6,296,989 B1
  Publication date: 2001-10-02
  Application number: 09/152,046
  
  
• Microlithographic materials and processes based on poly (hydroxyalkyl acrylates)
  Argitis Panagiotis, Vasilopoulou Maria, Gogolides Evangelos,
  Tegou Evangelia, Raptis Ioannis
  Greek patent Application number: 990100172
  Publication date: 26-5-1999
  Greek patent number: 1003420
  
  
• A capacitive type chemical-selective sensor and a method to fabricate same
  Normand Pascal, Goustourides Dimitrios, Tserepi Angeliki, Tsoukalas Dimitrios, Chatzandroulis Stavros
  Greek patent Application number: 20010100433
  Publication date: 2003-06-26
  Greek patent number: 1004286