Project Information per year
2012 - 2011 - 2010 - 2009 - 2008 - 2007 - 2006 - 2005 - 2004

PROJECT I.1
FUNCTIONAL MOLECULAR MATERIALS
FOR LITHOGRAPHY AND ORGANIC/MOLECULAR ELECTRONICS

Project Leader: P. Argitis
Key Researchers: P. Argitis, I. Raptis
Other collaborating researchers: D. Davazoglou, N. Glezos, E. Gogolides, K. Misiakos, P. Normand
Post-doctoral Research Associates: M. Chatzichristidi, A. Douvas, G. Patsis, M. Vasilopoulou
Ph.D. candidates: D. Drygiannakis, D. Niakoula, P. Pavli, N. Tsikrikas

Funding

- INTEL- MoleEUV, collaboration project for EUV resists, 2003-2006
- More Moore, EU FP6 Integrated Project (IST), 2004-2006
- Nano2Life, EU FP6 Network of Excellence (NMP), 2004-2007
- PENED “CMOS-NANO” project (GSRT-PHOTRONICS funding), 2005-2008
- Greece-Hungary bilateral cooperation (HARM.PB), 2005-2006

Research orientation

a. Development of resist platforms for next generation lithography
Development of resists with potential for sub 45 nm patterning : “molecular” resists, polymer back-bone breaking, exploration of resist resolution limits

b. Understanding and Optimization of Resist Patterning Processes : Material, Physicochemical and Process Studies
Priority in understanding the physicochemical phenomena encountered in ultra thin polymeric films and interfaces, and in molecular resists

c. Materials research for new micro-nano fabrication processes
Investigation of materials issues for novel radiation-assisted patterning processes, including formation of 3D structures, patterning of biological systems and photochemically-induced tuning of emission properties in OLEDs

d. Evaluation of new molecular classes as candidate components of lithographic or functioning microelectronic materials
Molecules which are not conventionally used in microelectronics are investigated for potential use either as components of lithographic materials or as functioning components of microelectronic devices following top-down or self-assembling processes.