Project Information per year
2012 - 2011 - 2010 - 2009 - 2008 - 2007 - 2006 - 2005 - 2004

PROJECT I.1
FUNCTIONAL MOLECULAR MATERIALS
FOR LITHOGRAPHY AND ORGANIC/MOLECULAR ELECTRONICS

Project Leader : P. Argitis

Key Researchers : P. Argitis, I. Raptis

Permanent research staff : A.M. Douvas, M. Vasilopoulou

Post-doctoral Research Associates : L. Palilis, M. Chatzichristidi, G. Patsis, D. Niakoula

Ph.D. candidates : D. Drygiannakis, D. Georgiadou, T. Manouras, P. Pavli, N. Tsikrikas

MSc and undergraduate students :A. Botsialas, A. Kapela

Collaborating researchers from other IMEL groups : E. Gogolides, N. Glezos, K. Misiakos, P. Normand

External Collaborators: N. Stathopoulos (TEI Piraeus), G. Pistolis, E.A. Couladouros, V.P. Vidali, (IPC-NCSRD), P.S. Petrou, S.E. Kakabakos, (IRRP-NCSRD), F. Watt, J. Van Kan (CIBA-NUS, Singapore), E.S. Valamontes (TEI of Athens), Th. Speliotis (IMS-NCSRD)

Research orientation

a. Optimization of lithographic materials and patterning processes - Development of new resists for high resolution, low LER ithography 

Current activities include
resists based on polymer back-bone breaking, resists based on unconventional imaging approaches, and experimental/simulation studies for supporting material and process optimization.

b. Lithographic materials and processes for micro-nano structure fabrication in MEMs and Nano-biotechnology

Investigation of material and process issues related to conventional and novel lithographic schemes proposed for patterning in the areas of MEMs, bio-MEMs and related fields

c. Materials research for organic/molecular electronics

Materials research and device architecture studies for molecular/organic electronics. Current activities include materials for molecular memories, organic light emitting diodes (OLEDs), photovoltaics and new optoelectronic devices.

Funding

- Nano2Life, EU FP6 Network of Excellence (NMP), 2004-2008
- GSRT-PENED 03ED276, “Critical sub-100nm Industrial scale Patterns for CMOS – NANO Architectures, (CMOS-NANO), 2005-2008
- GSRT-NON-EU 467, “Proton Beam NANOlithography for high aspect ratio structures of optical COMPonents” (PB.NANOCOMP), 2006-2008