Project Information per year
2012 - 2011 - 2010 - 2009 - 2008 - 2007 - 2006 - 2005 - 2004
PROJECT I.1
FUNCTIONAL MOLECULAR MATERIALS
FOR LITHOGRAPHY AND ORGANIC/MOLECULAR ELECTRONICS
Project Leader : P. Argitis
Key Researchers: P. Argitis, I. Raptis
Permanent research staff : A. Douvas, M. Vasilopoulou
Post-doctoral Research Associates : M. Chatzichristidi, L. Palilis, G. Patsis
Ph.D. candidates : D. Drygiannakis, D. Georgiadou, T. Manouras, P. Pavli, N. Tsikrikas
MSc and undergraduate students :A. Botsialas, A. Kapela
Collaborating researchers from other IMEL groups : D. Davazoglou, N. Glezos, E. Gogolides, K. Misiakos, P. Normand
External Collaborators: N. Stathopoulos (TEI Piraeus), G. Pistolis, E.A. Couladouros, V.P. Vidali, (IPC-NCSRD), P.S. Petrou, S.E. Kakabakos, (IRRP-NCSRD), A. Gerardino (IFN-CNR, Italy), I. Rajta (Atomki, Hungary), F. Watt, J. Van Kan (CIBA-NUS, Singapore), S. Tedesco, C. Vanuffel (LETI)
Research orientation
a. Development of Resists for low LER ithography - Optimization of Resist materials and Patterning Processes
Development of resists with potential low Line Edge Roughness (LER) capable for sub-32 nm patterning. Current activities include
“molecular” resists, resist based on polymer back-bone breaking and simulation studies for supporting material and process optimization.
b. Lithographic materials for new (unconventional) micro-nano structure fabrication processes
Investigation of material issues for novel radiation-assisted patterning processes, including formation of 3D structures and patterning of biological systems.
c. Materials for organic/molecular electronics
Materials research and device architecture studies for molecular/organic electronics. Current activities include materials for molecular memories, organic light emitting diodes (OLEDs), photovoltaics and new optoelectronic devices.
Funding
- More Moore, EU FP6 Integrated Project (IST), 2004-2007
- Nano2Life, EU FP6 Network of Excellence (NMP), 2004-2008
- GSRT-PENED 03ED276, “Critical sub-100nm Industrial scale Patterns for CMOS - NANO Architectures, (CMOS-NANO), 2005-2008
- GSRT-NON-EU 467, “Proton Beam NANOlithography for high aspect ratio structures of optical COMPonents” (PB.NANOCOMP), 2006-2008
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