Institute of Microelectronics - Research Projects

PROJECT I.2
LITHOGRAPHY and Plasma processes for ELECTRONICS, MICROFLUIDCS, and SURFACE Nano-ENGINEERING

Project leader: E. Gogolides
Key researchers: E. Gogolides, A. Tserepi
Collaborating researchers: K. Misiakos, I. Raptis, P. Argitis, C.Tsamis, S. Chatzandroulis
Permanent Researcher: V. Constantoudis
Researchers on Contract: G. Patsis, G. Kokkoris
PhD candidates: P. Bayiati, N. Vourdas, M. Vlachopoulou, G. Boulousis, K. Tsougeni, A. Malainou
MSc Students: D. Kotziambasis, A. Panagiotopoulos, K. Kontakis
Engineer: K. Kontakis
External collaborators: A. Boudouvis and M. Kalantzopooulou (NTUA, Greece), N. Hadjichristidis and E. Iatrou (UoA, Greece), S.Garbis and A. Vlahou (IIBEAA, Greece),
S. Kakabakos and P. Petrou (IRRP, NCSR-Demokritos, Greece), G. Kaltsas (TEI Athens Greece), K. Beltsios (U. Ioannina, Greece), E. Gizeli and K. Mitsakakis (Univ. of Crete-FORTH, Greece) C. Cardinaud (U. Nantes, France), I. Rangelow and B. Volland (Univ. Ilmenau Germany), M. Cooke and A. Goodyear (Oxford Instruments Plasma Technology, UK), S. Daniels (DCU, Ireland), A. Erdmann (Fraunhofer, Germany), S. Tedesco (CEA-LETI, France)

Objectives:

Our mission is to use lithography and plasma processing as enabling technologies for electronics, MEMs, microfluidics and lab-on-a-chip fabrication and modification. We are also developing new multiscale (continuum, Monte Carlo and Molecular Dynamics) simulation tools for these processes, while we are extending our tools to device simulation:

For nano-electronics our work focuses on Line Edge Roughness (LER) metrology, lithography process simulation and effects of LER on transistor operation (see section A).
For MEMS fabrication a positive tone easily strippable SU8 process was developed for metallization via lift-off (see section A).
For microfluidics we use soft lithography, Deep Plasma Etching, and plasma assisted bonding to fabricate PDMS, PMMA (and other organic polymer) based microfluidic devices, we fabricate capillary electrophoresis, and chromatography devices, we develop open microfluidics using electrowetting actuation. Finally we also demonstrate novel plasma based micro array technologies (see section B).
For nano-Engineering of Surfaces, we have developed promising nano manufacturing processes for nano-texturing of polymers, and modifying their optical, wetting, and biological behaviour. We can now fabricate superhydrophilic, superhydrophobic, antireflective, and highly protein absorbing smart polymer surfaces (see section C).
We have also developed the components of a total multi scale plasma simulator, comprising gas phase kinetics, surface kinetics, profile evolution, and stochastic etching simulation for nano-scale effect description (see section D)

Objectives:

Funding: