Project Information per year
2012- 2011 - 2010 - 2009 - 2008 - 2007 -2006 - 2005 - 2004

PROJECT I.2
LITHOGRAPHY and Plasma processes for ELECTRONICS, MICROFLUIDCS, and SURFACE Nano-ENGINEERING

Project Leader: E. Gogolides
Key Researchers: E. Gogolides, A. Tserepi
Collaborating Researchers: K. Misiakos, I. Raptis, P. Argitis, C.Tsamis, S. Chatzandroulis
Post-doctorals Researchers: G. Patsis, V. Constantoudis, G. Kokkoris
PhD candidates: P. Bayiati, N. Vourdas, M. Vlachopoulou, G. Boulousis, K. Tsougeni, A. Malenou

Projects Running

- EU IST IP More Moore, Contract No 507754, 1/1/2004-31/3/2007
- IEU NMP NoE Nano2Life, Contract No 500057, 1/2/2004-31/1/2008
- Contract with the company INTEL- MoleEUV, 1/5/2003-30/4/2006
- EU NMP2 STREP Nanoplasma, Contract No 016424 , 1/4/2006-31/3/2009
- GSRT, PENED 03 ED 202, 1/12/2005-31/11/2008

Objectives

Our work in nanopatterning focuses both on lithography and etching / processing: For lithography we focused on predicting the process and material effects on Line Edge Roughness (LER) and on nano transistor operation. We have proven for the first time that not only the sigma value of LER, but also the correlation length greatly impacts the device operation. Thus, small diffusion lengths during baking processes, and molecular photoresists are recommended. A demo of our LER measurement software is online on our site, while our molecular stochastic lithography simulator is steadily progressing.
For plasma process nanopatterning / nanotexturing we are studying nanotexturing of Si, and polymers. Our results for PDMS, and PMMA polymers have shown impressive high aspect ratio plasma induced nanotexture, and creation of superhydrophobic surfaces within 1 min of plasma processing. A PCT patent was filed, and two publications in Nanotechnology have appeared. Nanotexturing is being studied both by continuum and Monte Carlo models developed in our group. The continuum approach tries bring our level set based profile simulation algorithms to the nanoscale. Our level set based profile simulator will be available as demo software on our site within 2007.
This year a new plasma based nanotechnology project was initiated. The NANOPLASMA project funded by EU brings together plasma equipment industry, research and academia to design a feedback controlled next generation plasma etcher, capable of controlling the etch rate, profile evolution, and nanotexture / nanoroughness formation. The role of our group is to provide fast zero dimensional gas and surface kinetics modules, and to study the nanotexturing-nanoroughness formation.
Microfluidics fabrication and actuation has consumed significant effort. We are proposing an alternative technology for microfluidics patterned on polymeric substrates using plasma etching and plasma functionalisation. First results have been achieved on PMMA. Within less than half an hour processing in our ICP etcher we fabricate rectangular 20micron deep channels in polymers such as PMMA, and we are evaluating them for capillary electrophoresis. First results are available this year and demonstrate the viability of this mass production amenable technology.